High Temperature

Withstands up to 1000°C, suitable for various high-temperature thermal processing environments, ensuring stable operation under extreme conditions.

Real-time

Provides real-time precise wafer temperature data at specific points, ensuring real-time monitoring of the process and timely detection of temperature anomalies.

Visualization

Multi-point acquisition provides the entire wafer temperature distribution, intuitively displaying the temperature field for process analysis and optimization.

Fast Response

Fast response speed, accurately capturing key parameters, timely detection of temperature anomalies, ensuring process stability.

Process Controllable

Real-time monitoring of thermal process temperature changes to adjust process parameters, improving product yield and ensuring production quality.